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A schematic illustration of a photomask (top) and an IC layer printed using it (bottom) A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a ...
The Bahtinov mask is a device used to focus small astronomical telescopes accurately. Although masks have long been used as focusing aids, the distinctive pattern was invented by Russian amateur astrophotographer Pavel Bahtinov ( Russian: Павел Бахтинов) in 2005. [ 1][ 2] Precise focusing of telescopes and astrographs is critical ...
Optical proximity correction corrects these errors by moving edges or adding extra polygons to the pattern written on the photomask. This may be driven by pre-computed look-up tables based on width and spacing between features (known as rule based OPC) or by using compact models to dynamically simulate the final pattern and thereby drive the ...
CVS Health has not yet received or distributed any free masks, a company spokesperson said in a statement to TODAY. But it plans to in the coming weeks. "Through our continued participation in the ...
Integrated circuit layout. In integrated circuit design, integrated circuit ( IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
Military camouflage is the use of camouflage by armed forces to protect personnel and equipment from observation by enemy forces. Textile patterns for uniforms have multiple functions, including camouflage, identifying friend from foe, and esprit de corps. [ 1] The list is organized by pattern; only patterned textiles are shown.
Maskless lithography. Maskless lithography ( MPL) is a photomask -less photolithography -like technology used to project or focal-spot write the image pattern onto a chemical resist-coated substrate (e.g. wafer) by means of UV radiation or electron beam. [1]
Stencil lithography. Stencil lithography is a novel method of fabricating nanometer scale patterns using nanostencils, stencils (shadow mask) with nanometer size apertures. It is a resist-less, simple, parallel nanolithography process, and it does not involve any heat or chemical treatment of the substrates (unlike resist -based techniques).
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